Engineered for precision. Built for performance.

Heavily boron-doped polycrystalline diamond layers

Typical application: Electrochemistry
Pricing: 100 €


Research grade p-type diamond layers with metallic conductivity.
  • Excellent electrochemical stability
  • Wide potential window
  • Low background current
  • Chemically inert surface
  • Other specifications available on request
Key specifications

Parameter

Value

Substrate

Si / Glass / Ti (others on request)

Standard dimensions

20 × 20 mm

Thickness

500 nm (custom on request)

Surface roughness

< 30 nm RMS

Boron concentration

1 × 10²¹ cm⁻³

Resistivity

~10 mΩ·cm

Undoped polycrystalline diamond layers

Typical application: Protective coating
Pricing: 100 €


Research grade high-purity diamond coating delivering exceptional hardness, chemical resistance, and surface protection.
  • Extreme hardness
  • High chemical resistance
  • Long-term durability
  • Other specifications available on request
Key specifications

Parameter

Value

Substrate

Si / Glass / Ti (others on request)

Standard dimensions

20 × 20 mm

Thickness

500 nm (custom on request)

Surface roughness

< 30 nm RMS

Phosphorus  doped polycrystalline diamond layers

Typical application: Electronics / electrochemistry research
Pricing: upon request


N-type conductive polycrystalline diamond layers optimized for diamond electronics.
  • Tuned properties for your needs 
Key specifications

Parameter

Value

Substrate

Typically, Si

Standard dimensions

10 mm x 10 mm

Thickness

500 nm (custom on request)

Surface roughness

< 30 nm RMS

Phosphorus concentration

> 1 × 10²⁰ cm⁻³

Epitaxial diamond layers

Typical application: Electronics research
Pricing: upon request


Epitaxial diamond layers optimized for diamond research.
  • Tuned properties for your needs
  • Custom dopant (N, B, P)
  • Custom crystalline orientation
  • Custom dopant concentration
  • Custom layer thickness

Tailored to Your Requirements

We offer flexible substrate selection, custom dimensions, thickness adjustment, and doping concentration control.

  • Custom substrates
  • Variable thickness
  • Adjusted boron concentration
  • Application-specific optimization